Our research focus is in EDA (electronic design automation) and DT (design technology), trying to revolutionize the way integrated circuits and systems are designed and manufactured. Some of our recent topics are
  1. Machine learning in EDA: clock tree estimation, ECO (engineering change order) power optimization, wirelength prediction, IR drop analysis
  2. Lithography optimizations: OPC (optical proximity correction), EPC (etch proximity correction), litho modeling, SRAFs (sub-resolution assist features) prediction, layout pattern synthesis
  3. Low power: Clock gating synthesis, NTV (near-threshold voltage) design
  4. Exploratory devices and circuits: TFET (tunneling FET), airgap, SADP (self-aligned double patterning), DSA (directed self-assembly), crosslink, PCM (phase-change memory)