Pervaiz Kareem

R&D Engineer, IMEC

  • Last update
    May 31, 2023


  • KAIST, School of Electrical Engineering Ph.D. (Sep. 2017 – Aug. 2021)
  • KAIST, School of Electrical Engineering M.S. (Sep. 2015 – Aug. 2017)
  • COMSATS Institute of Information Technology, B.S. (Sep. 2011 – Jun. 2015)

Research Interests

  • Machine Learning for EDA
  • Design for manufacturability (DFM)


  1. Best Paper Award – Honorable Mention @ 2022 IEEE T-SM (Aug. 2022, see IEEE TSM May 2023 Editorial)


  • R&D engineer, IMEC (May 2023 – Present)
  • Senior application engineer, Synopsys Custom Design and Manufacturing Group (Jan. 2021 – Apr. 2023)
  • Research assistant, design technology lab (DTLab) (Aug. 2017 – Dec. 2020)
  • Research assistant, smart sensor architecture lab (SSAL) (Sep. 2015 – Jul. 2017)


Journal Papers

  1. Gangmin Cho, Yonghwi Kwon, Pervaiz Kareem, and Youngsoo Shin, “Integrated test pattern extraction and generation for accurate lithography modeling,” IEEE Transactions on Semiconductor Manufacturing, vol. 35, no. 3, pp. 495-503, Jun. 2022. (Best Paper Award – Honorable Mention)
  2. Pervaiz Kareem, and Youngsoo Shin, “Synthesis of Lithography Test Patterns Using Machine Learning Model,” IEEE Transactions on Semiconductor Manufacturing, vol. 34, no. 1, pp. 49-57, Feb. 2021.
  3. Pervaiz Kareem, Yonghwi Kwon, and Youngsoo Shin, “Layout pattern synthesis for lithography optimizations,” IEEE Transactions on Semiconductor Manufacturing, vol. 33, no. 2, pp. 283-290, May. 2020.
  4. Khan, Asim, Pervaiz Kareem, and Chong-Min Kyung. “ROM and recursion free high accuracy approximation of base-2 logarithm using MacLaurin series.” Electronics Letters 54.10 (2018): 622-624.

Conference Papers

  1. Zachary Levinson, Thuc Dam, Pervaiz Kareem, C. Jay Lee, Wolfgang Demmerle, Ulrich Klostermann, “Process optimization for next generation high-NA EUV patterning by computational lithography techniques,” Proc. SPIE Advanced Lithography, Apr. 2023.
  2. Pervaiz Kareem, Yonghwi Kwon, Gangmin Cho, and Youngsoo Shin, “Fast prediction of process variation band through machine learning models,” Proc. SPIE Advanced Lithography, Feb. 2021.
  3. Gangmin Cho, Yonghwi Kwon, Pervaiz Kareem, Sungho Kim, and Youngsoo Shin, “Test pattern extraction for lithography modeling under design rule revisions,” Proc. SPIE Advanced Lithography, Feb. 2021.
  4. Pervaiz  Kareem, Syed Ramiz Naqvi, Chong-Min Kyung, “A low error add and shift-based efficient implementation of base-2 logarithm”, Proc. Int. Conference on Electrical Engineering (ICEE), Mar. 2017, 1-6.
  5. Woojin Yun, Young-Gyu Kim, Yeongmin Lee, Jinyeon Lim, Wonseok Choi, Muhammas Umar Karim Khan, Asim Khan, Said Homidov, Pervaiz Kareem, Hyun Sang Park, Chong-Min Kyung, ” Offset aperture based hardware architecture for real time depth extraction”, Int. 2017 IEEE International Conference on Image Processing (ICIP) 2017.
  6. Pervaiz Kareem, Asim Khan, and Chong-Min Kyung. “Memory efficient self guided image filtering.” 2017 International SoC Design Conference (ISOCC). IEEE, 2017.