SPIE Photomask Technology + EUV Lithography 2025 congratulates Shilong Zhang, who won the First Place Photonics Best Student Presentation Award. His paper, “Integrated Curvilinear OPC and SRAF Optimization through Reinforcement Learning,” proposes a reinforcement learning-based method to co-optimize curvilinear SRAFs and main patterns, demonstrating significant improvements in pattern fidelity and process window robustness.
