SPIE Advanced Lithography + Patterning 2026 congratulates Shilong Zhang, who received the 2026 SPIE Nick Cobb Memorial Scholarship. At the conference, he presented his paper, “Etch Proximity Correction for Curvilinear Layout: Curve Sampling with ML Etch Bias Model,” demonstrating his outstanding and continued contributions to the field of advanced lithography and process proximity correction.
