Woohyun Chung (정우현)
Ph.D candidate, μComputing Lab., EE, KAIST

291 Daehak-ro, Yuseong-gu, Daejeon 34141, Korea
Phone: +82-42-350-5479 / Fax: +82-42-351-9895
Email: wh.chung at kaist.ac.kr
Office: NanoSoC S-204



Personal Information
  • Date of Birth: March 6th, 1990
  • Place of Birth: Seoul, Korea
  • Hobbies: Electric Guitar, Motorcycle, Coffee

Educations
  • Youngdong High School (2006.3 ~ 2009.2)
  • KAIST, Dept. of Electrical Engineering B.S. (2009.2 ~ 2013.8)
  • KAIST, Dept. of Electrical Engineering M.S. (2013.8 ~ 2014.8)
  • KAIST, Dept. of Electrical Engineering M.S. & Ph.D combined course (2014.8 ~)    

Research Interests
  • Design for manufacturability (DFM)
  • Lithography-aware physical design
  • CAD for directed self-assembly lithography (DSAL)
  • Latch placement optimization

Research Experience
  • IBM T.J. Watson Research Center, Contractor (Jan. ~ Jul., 2016)
  • LG Electronics, Visiting researcher (Mar. ~ Jul., 2014)

Publications
  • Journal Papers
    1. Seongbo Shim, Woohyun Chung, and Youngsoo Shin, “Lithography defect probability and its application to physical design optimization,” IEEE Transactions on CAD of Integrated Circuits and Systems, under review.
  • Conference Papers
    1. Seongbo Shim, Woohyun Chung, and Youngsoo Shin, "Redundant via insertion for multiple-patterning directed-self-assembly lithography," Proc. Design Automation Conf. (DAC), June 2016.
    2. Woohyun Chung, Seongbo Shim, and Youngsoo Shin, "Redundant via insertion in directed self-assembly lithography," Proc. Design, Automation & Test in Europe (DATE), Mar. 2016. 
    3. Seongbo Shim, Woohyun Chung, and Youngsoo Shin, "Defect probability of directed self-assembly lithography: fast identification and post-placement optimization," Proc. Int'l Conf. on Computer-Aided Design (ICCAD), Nov. 2015.
    4. Woohyun ChungSeongbo Shim, and Youngsoo Shin, "Identifying redundant inter-cell margins and its application to reducing routing congestion," Proc. Design, Automation & Test in Europe (DATE), pp. 1659-1664, Mar. 2015.
    5. Seongbo Shim, Woohyun Chung, and Youngsoo Shin, "Synthesis of lithographic test patterns through topology-oriented pattern extraction and classification," Proc. SPIE Advanced Lithography, pp. 1-10, Feb. 2014.